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Intern - Pee Dry Etch
2 weeks ago
**Our vision is to transform how the world uses information to enrich life for all.**
Join an inclusive team passionate about one thing: using their expertise in the relentless pursuit of innovation for customers and partners. The solutions we build help make everything from virtual reality experiences to breakthroughs in neural networks possible. We do it all while committing to integrity, sustainability, and giving back to our communities. Because doing so can fuel the very innovation we are pursuing.
JR24396 INTERN - PEE DRY ETCH
'-Description: Dry etching refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of ions that dislodge portions of the material from the exposed surface. The etching rate and the plasma ion directionality are heavily depends on tool design and configuration. In this project, students will have the hands-on opportunity to work on advanced industry-leading Etch Tool, gain 1st hand experience of Semiconductor Fab operations. Students will work with Process Engineering team and Tool Installation team on new tool characterization and qualification.
- Deliverable: Characterization data on the tunable edge ring across parts lifetime. Develop Best Known Method to reduce variation on this tool type and automate the process monitoring.
**About Micron Technology, Inc.**
All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, sexual orientation, gender identity, national origin, veteran or disability status.
Micron Prohibits the use of child labor and complies with all applicable laws, rules, regulations, and other international and industry labor standards.