Scientist (APM/Pattern Transfer/Lithography), IME

Job Responsibilities:

• Leading central lithography team under pattern transfer group.
• Selection, procurement and qualification of litho tool sets based on program -- from contact aligner to immersion.
• Actively working with cross functional stake owners to plan and develop new lithograpny process.
• Validate design, reticle tap out and post tap out verification.
• Assist in internal and external technical discussion to overcome process related challenge and provide relevant solution.
• Perform process characterization, margin study to determine the process capability of new process platform.
• Act as a subject matter expert and resource for researchers and industry partners to enable process and/or product realization.
• Publish process development outcome and breakthrough in research community.
• Engage with relevant equipment makers/vendors and responsible for selecting and procuring research equipment.
• Work with fab team in establishing SPC for newly developed process.
• Act as a resource for colleagues with less experience; lead small projects with manageable risks.
• Accelerate parallel process development capability to meet aggressive project timelines and supporting faster innovation cycles.
• Build a sustainable talent pipeline across both research and engineering levels.

Job Requirements:

• Ph.D/Master Degree in Materials Science, Electrical Engineering, Chemical Engineering, Physics, Chemistry, and Microelectronics, or closely related fields are welcome to apply.
• More than 10 years relevant working experiences in R&D and/or industry environment with broad exposure in handling 6", 8" and/or 12" substrate covering nano to micron tech nodes, preferably experiences in SiC/GaN/Photonics.
• Proficient in Photolithography tools including Immersion/KrF/I-line Scanner/Stepper/Mask Aligner, knowledge in EBEAM Lithography tool will be added advantage.
• Hands-on experiences in metrology including but not limited to CDSEM, Overlay, OCD, DRSEM, Microscope. Capable to create recipe to support various research requirement.
• Knowledge in design and simulation (Prolith, OPC, etc), reticle layout (oas, gds) review and basic tap out process.
• Equip with Lithography skills set including fundamental Lithography theory, Photoresist characteristic and application, new process setup (swing curve, FEM, DOE, statistical root cause analysis and problem solving methods, etc), optimization and margin improvement.