Engineer, Application Metrology

Bring more to life.

Are you ready to accelerate your potential and make a real difference within life sciences, diagnostics and biotechnology?

At Pall Corporation, one of Danaher's 15+ operating companies, our work saves lives—and we're all united by a shared commitment to innovate for tangible impact. 

You'll thrive in a culture of belonging where you and your unique viewpoint matter. And by harnessing Danaher's system of continuous improvement, you help turn ideas into impact – innovating at the speed of life.

As a global leader in high-tech filtration, separation, and purification, Pall Corporation thrives on helping our customers solve their toughest challenges. Our products serve diverse, global customer needs across a wide range of applications to advance health, safety and environmentally responsible technologies. From airplane engines to hydraulic systems, scotch to smartphones, OLED screens to paper—everyday Pall is there, helping protect critical operating assets, improve product quality, minimize emissions and waste, and safeguard health. For the exponentially curious, Pall is a place where you can thrive and amplify your impact on the world. Find what drives you on a team with a more than 75-year history of discovery, determination, and innovation.

Learn about the Danaher Business System which makes everything possible.

The Engineer, Application Metrology is responsible to own the application metrology strategy for photolithography and wet etch chemistries, develop off-track test methods that replicate fab conditions, and translate findings into product requirements for our rapidly growing Microelectronics business. You will also work independently drive research and New Product Development (NPD) programs, guide cross-functional teams, and build capabilities that quantify filtration impact on wafer yield and defectivity.

This position reports to the R&D Supervisor, Science and is part of the Research and Development Team located in Benoi, Singapore and will be an on-site role.

In this role, you will have the opportunity to:

• Design and implement metrology systems that replicate lithography track and wet etch environments outside the fab, enabling rapid filter concept iteration without tool time.
• Develop and validate ultra-trace analytical methods (ICP-MS, GC-MS, LC-MS/MS) to detect metals, ions, VOCs, oligomers, PAG fragments, and surfactants at sub-ppb/ppt levels.
• Establish and execute filter challenge testing for photolithography and wet etch processes, defining test vehicles, chemistries, and stress profiles, and quantifying extractables/leachables and nanoparticles using complementary techniques.
• Apply advanced statistical tools (DOE, MSA/GR&R, SPC) to optimize processes, set specifications, and drive data-based decisions.
• Collaborate with global teams across time zones, participate in occasional off-hours calls, and travel up to 10% domestically and internationally.

The essential requirements of the job include

• Holds a BS in Chemical or Process Engineering (MS/PhD preferred) with minimum 4 years of R&D or product development experience, specifically in ultra-trace application metrology for semiconductor or similarly demanding industries.
• Demonstrated hands-on expertise in ICP-MS, GC-MS, and LC-MS/MS, including method development and validation (LOD/LOQ, linearity, recovery, matrix effects, carryover), with proven ability to operate, troubleshoot, and interpret data.
• Proven ability to lead metrology projects independently, delivering validated analytical methods and achieving detection limits at sub-ppb/ppt levels.
• Strong track record of applying statistical tools (DOE, MSA/GR&R, SPC) to optimize processes and establish specifications.
• Excellent communication skills, evidenced by clear technical reports and presentations to cross-functional teams and senior leadership.

It would be a plus if you also possess previous experience in:

• Experience in filter design, membrane science, fluid dynamics, and surface modification, as well as particle metrology techniques (OPC/LPC, NTA/DLS).
• Demonstrated ability to set up new labs, including facility layout, UHP utilities, cleanliness protocols, and instrument qualification.
• Familiarity with semiconductor OEM or fab processes, with exposure to photolithography and wet etch chemistries.

Pall Corporation, a Danaher operating company, offers a broad array of comprehensive, competitive benefit programs that add value to our lives. Whether it's a health care program or paid time off, our programs contribute to life beyond the job.

Join our winning team today. Together, we'll accelerate the real-life impact of tomorrow's science and technology. We partner with customers across the globe to help them solve their most complex challenges, architecting solutions that bring the power of science to life.

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